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CAS号: | |
英文名称: | Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) |
英文同义词: | Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis;Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) |
中文名称: | 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, |
中文同义词: | 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,;氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR);氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR) |
CBNumber: | CB51569112 |
分子式: | HfO2 |
分子量: | 0 |
MOL File: | Mol file |
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氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,化学性质 |
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氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 性质、用途与生产工艺 |
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氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 上下游产品信息 |
上游原料
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下游产品
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氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR)
氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR)
Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis
Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
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