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| 中文名称: | 碳化硅溅射靶 | | 中文同义词: | 碳化硅溅射靶 | | 英文名称: | SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS) | | 英文同义词: | SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS) | | CAS号: | | | 分子式: | | | 分子量: | 0 | | EINECS号: | | | 相关类别: | |
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